Kiel Nano, Surface and Interface Science (KiNSIS)

Plasma Potential Distribution and Electron Heating in Sputtering Magnetrons (Prof. Dr. A. Anders, Leibniz Institute of Surface Engineering)

08.05.2018 ab 16:15

Hans - Geiger - Hörsaal (LS13 - R.52) des Physikzentrums

Abstract

Sputtering magnetrons are widely used to make thin films and are generally consid-ered a mature technology. Over the last years it has become known that magnetrons show surprisingly rich physics based on plasma instabilities. Without these instabili-ties, magnetrons would generally not work. The energy needed to ionize atoms of the process gas and sputtered from the target is generallythought to be delivered by "hot" secondary electrons (Penning-Thornton paradigm). Recent theoretical [1], spectro-scopic [2], and probe data [3] however indicate that most of the electrons’ energy comes from the presheath, and is provided by localized electric fields concentrated at the edge of "ionization zones" or "spokes" [4, 5]. This is closely related to self-organization and turbulence as observed in interesting images of magnetron plasmas.

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